CaltechAUTHORS
Published June 21, 2017 | Version Supplemental Material
Journal Article Open

Pulsed laser-deposited n-Si/NiO_x photoanodes for stable and efficient photoelectrochemical water splitting

Creators

  • 1. ROR icon Xi'an Jiaotong University
  • 2. ROR icon University of California, Berkeley
  • 3. ROR icon Joint Center for Artificial Photosynthesis
  • 4. ROR icon California Institute of Technology
  • 5. ROR icon Division of Chemistry

Abstract

An electrocatalytic and stable nickel oxide (NiO_x) thin layer was successfully deposited on an n-Si (100) substrate by pulsed laser deposition (PLD), acting as a photoanode for efficient photo-oxidation of water under solar illumination. It was revealed that the formed n-Si/NiO_x heterojunction with good Schottky contact could improve photogenerated charge separation, and thus n-Si photoanodes deposited with a 105 nm-thick NiO_x electrocatalytic layer exhibited a photovoltage of ∼350 mV, leading to greatly improved photoelectrochemical performances for water oxidation. The stability of the photoanode was significantly enhanced with the increasing thickness of NiO_x protective layers. This study demonstrates a simple and effective method to enable the use of planar n-Si (100) substrates as efficient and durable photoanodes for practical solar water oxidation.

Additional Information

© 2017 The Royal Society of Chemistry. Received 19th January 2017; Accepted 14th May 2017; First published on 15 May 2017. The authors gratefully acknowledge the financial support from the National Natural Science Foundation of China (51672210, 51323011 and 51236007), the Program for New Century Excellent Talents in University (NCET-13-0455), the Natural Science Foundation of Shaanxi Province (2014KW07-02), the Natural Science Foundation of Jiangsu Province (BK 20141212) and the Nano Research Program of Suzhou City (ZXG201442). S. Shen is supported by the Foundation for the Author of National Excellent Doctoral Dissertation of P. R. China (201335), the National Program for Support of Top-notch Young Professionals, and the "Fundamental Research Funds for the Central Universities". S. S. Mao acknowledges the support from the Shenzhen Peacock Plan (No. 1208040050847074).

Attached Files

Supplemental Material - c7cy00114b1_si.pdf

Files

c7cy00114b1_si.pdf

Files (388.7 kB)

Name Size
md5:12b747141c5b7e77aa13f4fdd6e0bb75
388.7 kB Preview Download

Additional details

Identifiers

Eprint ID
77805
DOI
10.1039/c7cy00114b
Resolver ID
CaltechAUTHORS:20170526-095044384

Funding

National Natural Science Foundation of China
51672210
National Natural Science Foundation of China
51323011
National Natural Science Foundation of China
51236007
Program for New Century Excellent Talents in University
NCET-13-0455
Natural Science Foundation of Shaanxi Province
2014KW07-02
Natural Science Foundation of Jiangsu Province
BK 20141212
Nano Research Program of Suzhou City
ZXG201442
Foundation for the Author of National Excellent Doctoral Dissertation
201335
National Program for Support of Top-notch Young Professionals
Fundamental Research Funds for the Central Universities
Shenzhen Peacock Plan
1208040050847074

Dates

Created
2017-05-26
Created from EPrint's datestamp field
Updated
2021-11-15
Created from EPrint's last_modified field

Caltech Custom Metadata

Caltech groups
JCAP