Published May 2010 | Version public
Journal Article

Silicon microcantilevers with MOSFET detection

  • 1. ROR icon Institute of Microelectronics of Barcelona
  • 2. ROR icon California Institute of Technology

Abstract

We report the fabrication of silicon microcantilevers with MOSFET detection, to be used in force measurements for biomolecular detection. Thin cantilevers are required for a high force sensitivity. Therefore the source and drain of the transistors have been fabricated by As implantation to obtain shallow PN junctions. The cantilevers have been oriented on the non-standard (1 0 0) crystallographic direction of silicon, to maximize the stress response of the NMOS transistors. The force sensitivity and resolution of the cantilevers have been tested by applying a force with an AFM tip. Values of 25 μV/pN and 56 pN respectively have been obtained for a force applied at the tip of a cantilever with a length of 200 μm, a width of 24 μm and a silicon thickness of 340 nm.

Additional Information

© 2009 Elsevier B.V. Received 13 September 2009; revised 3 November 2009; accepted 23 November 2009. Available online 26 November 2009. Work supported by the Spanish Ministry of Science and Innovation through Project TEC2007-65692, and through the NANOSELECT Project of the Consolider-Ingenio 2010 Programme.

Additional details

Identifiers

Eprint ID
18417
DOI
10.1016/j.mee.2009.11.125
Resolver ID
CaltechAUTHORS:20100525-085144276

Funding

Spanish Ministry of Science and Innovation
Project TEC2007-65692
NANOSELECT Project of the Consolider-Ingenio 2010 Programme

Dates

Created
2010-05-25
Created from EPrint's datestamp field
Updated
2021-11-08
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