Published November 1995
| Version Published
Journal Article
Open
Fabrication of ultrasmall magnets by electroplating
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1.
California Institute of Technology
Abstract
We use high voltage electron beam lithography followed by electroplating to define small metal features on semiconductor substrates. These have been used to form high resolution etch masks, dense nanomagnet arrays, and highly anisotropic metal nanostructures. To reproducibly obtain uniform arrays of such structures, we have developed an end-point detection technique, which is based on in situ observation of the electrodeposition process.
Additional Information
© 1995 American Vacuum Society (Received 2 June 1992; accepted 15 September 1995) The authors wish to acknowledge many helpful discussions with S. Heckman at Hughes Research Laboratory and Dr. S. Schultz and R. O'Barr from the Center for Magnetic Recording Research (CMRR) at the University of California, San Diego. This work was supported in part by NSF Grant No. ECS93-10681.Attached Files
Published - XUWjvstb95.pdf
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XUWjvstb95.pdf
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Identifiers
- Eprint ID
- 2863
- Resolver ID
- CaltechAUTHORS:XUWjvstb95
Funding
- NSF
- ECS93-10681
Dates
- Created
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2006-05-03Created from EPrint's datestamp field
- Updated
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2021-11-08Created from EPrint's last_modified field
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- Physics Department