Published November 28, 2005 | Version public
Journal Article Open

Controlled nonuniformity in macroporous silicon pore growth

  • 1. ROR icon Max Planck Institute of Microstructure Physics

Abstract

Photoelectrochemical etching of uniform prestructured silicon wafers in hydrofluoric acid containing solutions yields periodic structures that can be applied to two- and three-dimensional photonic crystals or microfluidics. Here we demonstrate experimentally macroporous silicon etching initiated by a nonuniform predefined lattice. For conveniently chosen parameters we observe a stable growth of pores whose geometrical appearance depends strongly on the spatially different nucleation conditions. Moreover, we show preliminary results on three-dimensionally shaped pores. This material can be used to realize hybrid photonic crystal structures and incorporate waveguides in three-dimensional photonic crystals.

Additional Information

Copyright © 2005 American Institute of Physics. Received 16 September 2005; accepted 12 October 2005; published online 23 November 2005. The authors thank B. Hasler (Infineon Technologies) for the supply of surface-structured silicon wafers. This project was partly financed by a research award for young scientists given by the government of Saxony-Anhalt in 2003 to one of the authors (S.M.).

Files

MATapl05.pdf

Files (395.3 kB)

Name Size
md5:b2045811af9c3335a3002e512e73823e
395.3 kB Preview Download

Additional details

Identifiers

Eprint ID
2116
Resolver ID
CaltechAUTHORS:MATapl05

Dates

Created
2006-03-09
Created from EPrint's datestamp field
Updated
2021-11-08
Created from EPrint's last_modified field