Published February 14, 2023 | Version public
Journal Article

Influence of lasing parameters on the morphology and electrical resistance of polyimide-based laser-induced graphene (LIG)

  • 1. ROR icon Pontificia Universidad Javeriana
  • 2. ROR icon California Institute of Technology

Abstract

Laser-induced graphene (LIG) uses a CO₂ infrared laser scriber for transforming specific polymer substrates into porous graphene. This technique is simple, scalable, low-cost, free of chemicals, and produces a 3D graphene for applications across many fields. However, the resulting 3D graphene is highly sensitive to the lasing parameters used in their production. Here, we report the effects of power, raster speed, number of lasing passes (with and without spot overlapping) on the resulting LIG structure, morphology, and sheet resistance, using a polyimide (PI) substrate. We find that the number of lasing passes, laser spot overlapping and brand of PI used had a strong influence on the quality of the LIG, measured in terms of the I_(G)/I_(D) and I_(2D) Raman bands and sheet resistance. Increasing number of passes and overlapping of laser spots led to increased LIG pore sizes, larger graphene scales, and reduced sheet resistance. Furthermore, the over-the-counter desktop CO₂ aser engraving unit used introduced additional restrictions that limited the quality of the LIG produced, particularly due to inconsistent control of the laser scribing speed and a poor thermal management of the laser unit.

Additional Information

J. De la Roche was funded through the OMICAS alliance ("Optimización Multiescala In-silico de Cultivos Agrícolas Sostenibles—Infraestructura y validación en Arroz y Caña de Azúcar"), part of the Scientific Colombia ecosystem, sponsored by the World Bank, the Ministry of Science, Technology and Innovation (MINCIENCIAS), ICETEX, the Colombian Ministry of Education and the Colombian Ministry of Commerce, Industry and Tourism (under Grant id: FP44842-217-2018, award ID: 792-61187). I.L-C was funded through the Newton Fund grant # TSP2021\100159. The authors would also like to thank Tecnoparque SENA, nodo Cali for the technical support under the ID P2021-031070-8860 project. Departamento Administrativo de Ciencia, Tecnología e Innovación (COLCIENCIAS), FP44842-217-2018

Additional details

Identifiers

Eprint ID
118845
Resolver ID
CaltechAUTHORS:20230117-372591200.39

Funding

Ministerio de Comercio, Industria y Turismo (Ministerio de Comercio, Industria y Turismo)
FP44842-217-2018
Newton Fund
TSP2021\100159
World Bank
Ministerio de Ciencia, Tecnología e Innovación (MINCIENCIAS)
Instituto Colombiano de Crédito Educativo y Estudios Técnicos en el Exterior Mariano Ospina Pérez (ICETEX)
Ministry of Education (Colombia)

Dates

Created
2023-02-14
Created from EPrint's datestamp field
Updated
2023-02-14
Created from EPrint's last_modified field