Published February 1998 | Version public
Book Section - Chapter

Fractal capacitors

Abstract

This paper introduces a high-density linear capacitor structure with low bottom-plate parasitics. The density of such a structure improves as process technologies scale. Fractal capacitors retain the linearity of metal-to-metal capacitors with limited degradation of Q. The structures automatically limit the length of the thin metal sections to a few microns, keeping the series resistance reasonably small. Another advantage is the reduction of bottom-plate capacitance because of the smaller area.

Additional Information

© 1998 IEEE. Date of Current Version: 06 August 2002. The authors acknowledge T. Ahrens for helpful discussions.

Additional details

Identifiers

Eprint ID
28807
DOI
10.1109/ISSCC.1998.672459
Resolver ID
CaltechAUTHORS:20120117-110114752

Dates

Created
2012-01-17
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Updated
2021-11-09
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