Published November 12, 2008
| Version public
Journal Article
Azidation of silicon(111) surfaces
Abstract
A two-step chlorination/azidation process was reported to prepare azide-modified silicon(111) surfaces. XPS and IR analyses show the covalent bonding of azide with silicon. In combination with scanning tunneling microscopy and spectroscopy analyses, different kinetic rates, azide coverages, and surface-area distributions were derived depending on the azidation solvent.
Additional Information
© 2008 American Chemical Society. Received June 11, 2008. We acknowledge the Beckman Institute for the use of both XPS and FTIR instruments as well as the NSF (NSF-CCF-05204490) and the MARCO Center for Advanced Materials and Devices for funding. We thank Bolin Lin for helpful discussions on the choice of reaction solvent, Heather Agnew for IR suggestions, and Dr. Lidong Qin for graphics assistance.Additional details
Identifiers
- Eprint ID
- 13674
- DOI
- 10.1021/ja804448p
- Resolver ID
- CaltechAUTHORS:CAOjacs08
Related works
- Describes
- 10.1021/ja804448p (DOI)
Funding
- NSF
- CCF-05204490
- Microelectronics Advanced Research Corporation (MARCO)
Dates
- Created
-
2009-07-06Created from EPrint's datestamp field
- Updated
-
2021-11-08Created from EPrint's last_modified field