CaltechAUTHORS
Published March 2017 | Version public
Book Section - Chapter Metadata-only

Antireflective textured silicon optics at millimeter and submillimeter wavelengths

Creators

  • 1. ROR icon Jet Propulsion Lab
  • 2. ROR icon California Institute of Technology
  • 3. ROR icon Smithsonian Astrophysical Observatory

Abstract

Silicon optics with broadband antireflective (AR) treatments are being developed for millimeter and submillimeter-wave applications. Combined photolithography and deep reactive ion etching (DRIE) techniques are used to texture the surfaces of high resistivity, low loss silicon wafers. We report on the design, fabrication, and testing at 250 GHz of single and double layer AR treatments on silicon optics.

Additional Information

© 2017 IEEE. This research was carried out with partial support from NASA (NNX15AE01G) at the California Institute of Technology, the Caltech Submillimeter Observatory Hilo office, and at the Jet Propulsion Laboratory, operated by the California Institute of Technology under a contract with the National Aeronautics and Space Administration.

Additional details

Identifiers

Eprint ID
77741
Resolver ID
CaltechAUTHORS:20170524-164519696

Funding

NASA
NNX15AE01G

Dates

Created
2017-05-25
Created from EPrint's datestamp field
Updated
2021-11-15
Created from EPrint's last_modified field

Caltech Custom Metadata

Caltech groups
Astronomy Department